Process Analysis Exposure Equipment - メーカー・企業と業務用製品 | イプロスものづくり

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Photo Process Analysis Exposure Device ES-3500LP

Equipped with an excimer lamp manufactured by Ushio Electric. A 193nm compatible analytical exposure device.

The photo process analysis exposure device ES-3500LP is equipped with a Ushio Electric Co., Ltd. excimer lamp instead of the laser light source used in the VUVES-4500. It does not require a large gas supply system like a laser light source, allowing for installation in various locations. For more details, please contact us or refer to the catalog.

企業：リソテックジャパン
価格：Other

Other process controls
Spectroscopic Analysis Equipment
Process Analysis Exposure Equipment

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Photo Process Analysis Exposure Device UVES Series

Up to 25 locations can be exposed with varying exposure conditions using open-frame exposure.

The UVES series photo process analysis exposure device is an exposure tool for research and development of photoresists. By performing step exposure, it allows for open-frame exposure with varying exposure conditions at up to 25 locations. By developing and analyzing the exposed samples using a resist development analyzer, it accelerates the material and process development of photoresists. Furthermore, by using the optional degassing collection unit, it enables component analysis of outgassing from the resist during exposure. For more details, please contact us or refer to the catalog.